Exposure apparatus, light source apparatus and device fabrication
AssigneeCanon Kabushiki Kaisha
InventorHajime Kanazawa
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Abstract
An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source for generating a plasma, said light source including a condenser mirror that condenses a light irradiated from the plasma, an illumination optical system for illuminating the mask using the light condensed by the condenser mirror, a detector that is provided between the condenser mirror and the illumination optical system, said detector detecting a property of the light, and a changing part for changing a state of the plasma based on a detected result of the detector.
Claims7
An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus comprising:
- a light source for generating a plasma, said light source including a condenser mirror that condenses a light irradiated from the plasma;
- an illumination optical system for illuminating the mask using the light condensed by the condenser mirror;
- a detector that is provided between the condenser mirror and the illumination optical system, said detector detecting a property of the light;
- and
- a changing part for changing a state of the plasma based on a detected result of the detector.
Dependencies are inferred from the claim text.