Stage apparatus, lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a support constructed to support a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate table constructed to hold a substrate;
• a projection system configured to project the patterned radiation onto a target portion of the substrate, and
• a positioning device configured to displace the support in a first direction;
• wherein the support is provided with a clamping device configured to clamp the patterning device by a first clamping force, and wherein the first clamping force is controllably adjustable by a control unit during the displacement of the support based upon a state of the patterning device.

A lithographic apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a patterning device support constructed to support a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate support constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
• a positioning device configured to displace one of the supports in a first direction, the support being provided with a clamping device configured to clamp the respective patterning device or substrate by a first clamping force;
• and
• a control unit configured to controllably adjust the first clamping force during displacement of the support based upon a state of the respective patterning device or substrate.