Method for purifying a metal carbonyl precursor
AssigneeTokyo Electron Limited
InventorKenji Suzuki
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorKenji Suzuki
Estimating the term…
A method of purifying a metal carbonyl precursor in a metal precursor vaporization system where the metal carbonyl precursor comprises a metal particulate impurity. The method includes flowing a CO-containing gas through the metal precursor vaporization system to a precursor collection system in fluid communication with the metal precursor vaporization system to separate the metal carbonyl precursor from the metal particulate impurity and to transfer the metal carbonyl precursor to the precursor collection system, and collecting the transferred metal carbonyl precursor in the precursor collection system, where an amount of the metal particulate impurity is lower in the precursor collection system than in the precursor vaporization system and the precursor collection system is maintained at a lower temperature than the metal precursor vaporization system. A metal carbonyl precursor parameter may be monitored to determine a status of the metal carbonyl precursor and the need for purifying the metal carbonyl precursor.
A method of purifying a metal carbonyl precursor in a metal precursor vaporization system where the metal carbonyl precursor comprises a metal particulate impurity, the method comprising:
A method of processing one or more substrates using a metal carbonyl precursor, the method comprising:
A method of purifying a metal carbonyl precursor, the method comprising:
Dependencies are inferred from the claim text.