Method and apparatus for characterizing features formed on a substrate
AssigneeApplied Materials, Inc.
InventorsMichael C. Smayling, Susie Xiuru Yang, Michael P. Duane
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AssigneeApplied Materials, Inc.
InventorsMichael C. Smayling, Susie Xiuru Yang, Michael P. Duane
Estimating the term…
A method and apparatus for testing and characterizing features formed on a substrate. In one embodiment, a test structure is provided that includes a test element having a first side and an opposing second side. A first set of one or more structures defining a first region having a first local density are disposed adjacent the first side of the test element. A second set of one or more structures defining a second region having a second local density are disposed adjacent the second side of the test element. A third set of one or more structures defining a third region having a first global density are disposed adjacent the first region. A fourth set of one or more structures defining a fourth region having a second global density are disposed adjacent the second region.
A method of determining the effect of surrounding structures on a test structure formed on a semiconductor substrate, comprising:
A method of forming an information library for use in designing or fabricating integrated circuits, comprising:
Dependencies are inferred from the claim text.