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US 7,459,260 B2Granted
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method
AssigneeIntel Corporation
InventorsManish Chandhok, Wang Yueh, Heidi Cao
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Abstract
A modified EUV photoresist and a method of making the resist. The modified resist includes an EUV photoresist and a LAM incorporated into the EUV photoresist.
Claims27
A method of making a modified EUV photoresist comprising:
- providing an EUV photoresist;
- providing a light absorbance material (LAM);
- and
- incorporating the LAM into the EUV photoresist to make the modified EUV photoresist, wherein:
- the LAM has an absorbance to out-of-band radiation in a wavelength range of an EUV source selected to illuminate the modified EUV photoresist;
- and
- the modified EUV photoresist has a bulk sensitivity to out-of-band radiation of the EUV source that is reduced with respect to a bulk sensitivity to out-of-band radiation of the EUV photoresist prior to incorporating.
4 more elements
A modified EUV photoresist comprising:
- an EUV photoresist;
- and
- a LAM incorporated into the EUV photoresist to make the modified EUV photoresist wherein:
- the LAM has an absorbance in an out-of-band wavelength range of an EUV source selected to illuminate the modified EUV photoresist;
- and
- the modified EUV photoresist has a bulk sensitivity to out-of-band radiation of the EUV source that is lower with respect to a bulk sensitivity to out-of-band radiation of an EUV photoresist without the LAM.
3 more elements
A mixture comprising:
- a composition including:
- a resin having photoacid-labile groups;
- and
- at least one photoacid generator compound;
- and
- a LAM blended into the composition to yield a modified composition, wherein:
- the LAM has an absorbance in an out-of-band wavelength range of an EUV source selected to illuminate the modified composition;
- and
- the modified composition has a bulk sensitivity to out-of-band radiation of the EUV source that is lower with respect to a bulk sensitivity to out-of-band radiation of an composition without the LAM.
6 more elements
Dependencies are inferred from the claim text.