Dry etching apparatus, dry etching method, and plate and tray used therein
AssigneeKYOCERA Corporation
InventorsYosuke Inomata, Yuko Fukawa
Life of this patent
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Abstract
A dry etching apparatus that performs etching on a substrate 1 placed on a tray 13 inside a chamber 18 by covering the substrate 1 with a plate 14 provided with opening portions 15, in which a distance D between the surface opposing the substrate 1 and the substrate 1 in the peripheral portion of the plate 14 is set shorter than the distance D between the surface opposing the substrate 1 and the substrate 1 in the central portion of the plate 14. Textures can be thus formed homogeneously on the surface of the substrate.
Claims7
A method for producing a solar cell, comprising:
- placing a substrate for a solar cell on an electrode inside a chamber;
- covering said substrate with a plate, wherein said plate is provided with a number of opening portions;
- and
- forming textures on a surface of the substrate by using residues generated during etching and being chiefly composed of components of the substrate as an etching mask, wherein a distance between said substrate and a surface of said plate opposing said substrate in a peripheral portion of said plate is set shorter than a distance between said substrate and said surface opposing said substrate in a central portion of said plate.
A method for producing a solar cell, comprising:
- placing a substrate for a solar cell on an electrode inside a chamber;
- covering said substrate with a plate provided with a number of opening portions;
- forming textures on a surface of said substrate using residues generated during etching and being chiefly composed of components of the substrate as an etching mask,
- wherein said plate is provided with a protruding wall on a surface opposing said substrate and said protruding wall is separated from a nearest surface of said substrate by a space.
Dependencies are inferred from the claim text.