Calibration substrate and method for calibrating a lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsJoost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens, Frederick Eduard De Jong, Koen Goorman, Boris Menchtchikov
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Abstract
A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
Claims45
A calibration substrate for use during calibration of a lithographic apparatus, the calibration substrate comprising:
- a first substantially flat surface;
- a second substantially flat surface that is substantially parallel to the first surface;
- and
- an edge that connects the first surface to the second surface,
- wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
A method for calibrating a lithographic apparatus, the method comprising:
- imaging a marker provided on a patterning device onto a radiation-sensitive layer on a calibration substrate with a beam of radiation;
- measuring a property of the image of the marker on the calibration substrate;
- determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus;
- and
- adjusting at least one of the operating parameters of the apparatus to correct for the error,
- wherein the calibration substrate comprises a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, and
- wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
A method for manufacturing a device using a lithographic apparatus, the method comprising:
- calibrating the lithographic apparatus with a calibration substrate, the calibration substrate comprising a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the calibration substrate while in the lithographic apparatus;
- patterning a beam of radiation;
- projecting a patterned beam of radiation onto a target area of a radiation sensitive material of a production substrate.
A lithographic apparatus in combination with a calibration substrate for use during calibration of the lithographic apparatus, the lithographic apparatus comprising:
- an illumination system for conditioning a beam of radiation;
- a support structure for supporting a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section;
- a substrate table for holding the calibration substrate;
- and
- a projection system for projecting the patterned beam of radiation onto a target portion of the calibration substrate, and
- the calibration substrate comprising a first substantially flat surface;
- a second substantially flat surface that is substantially parallel to the first surface;
- and
- an edge that connects the first surface to the second surface,
- wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
Dependencies are inferred from the claim text.