Integrated semiconductor memory and method for operating a semiconductor memory
AssigneeInfineon Technologies AG
InventorsStephan Schröder, Herbert Benzinger, Georg Erhard Eggers, Manfred Pröll, Jörg Kliewer
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AssigneeInfineon Technologies AG
InventorsStephan Schröder, Herbert Benzinger, Georg Erhard Eggers, Manfred Pröll, Jörg Kliewer
Estimating the term…
An integrated semiconductor memory device includes at least one memory cell, at least one sense amplifier and a pair of bit lines connected to each sense amplifier, where each memory cell includes a selection transistor and a storage capacitor. The storage capacitor of each memory cell includes a first capacitor electrode and a second capacitor electrode, and the selection transistor of each memory cell includes a first source/drain region that is connected by a first contact connection to one bit line of a pair of bit lines corresponding with the memory cell, and a second source/drain region that is conductively connected to the first capacitor electrode of the storage capacitor of the memory cell. The second capacitor electrode of the storage capacitor of each memory cell is connected to the other bit line of the pair of bit lines corresponding with the memory cell.
An integrated semiconductor memory device comprising at least one memory cell, at least one sense amplifier and a pair of bit lines connected to each sense amplifier, and each memory cell includes a selection transistor and a storage capacitor;
A method for operating a semiconductor memory device that includes at least one memory cell, at least one sense amplifier and a pair of bit lines connected to each sense amplifier, wherein each memory cell includes a selection transistor and a storage capacitor, each storage capacitor includes a first capacitor electrode and a second capacitor electrode, each selection transistor includes a first source/drain region that is connected by a first contact connection to one bit line of a pair of bit lines corresponding with a respective memory cell and a second source/drain region that is conductively connected to the first capacitor electrode of the storage capacitor of the respective memory cell, and the second capacitor electrode of each storage capacitor is connected by a second contact connection to the other bit line of the pair of bit lines corresponding with the respective memory cell, wherein the method comprises:
A method of manufacturing a memory device, the method comprising:
Dependencies are inferred from the claim text.