Liquid jet and recovery system for immersion lithography

A method of immersion lithography that projects an image pattern onto a workpiece through an optical element disposed opposite the workpiece, an exposure region being defined between the optical element and the workpiece, the method comprising the steps of:

• providing arrays of nozzles with openings proximally located to the exposure region, each of the nozzles alternately serving as a source nozzle and as a recovery nozzle;
• during a first selection time, supplying a liquid through selected ones of the arrays of nozzles into the exposure region such that the liquid contacts both the workpiece and the optical element for immersion lithography at least while the image pattern is being projected onto the workpiece through the optical element;
• and
• during a second selection time that is different from the first selection time, recovering liquid from the exposure region through the same arrays of nozzles used to supply liquid during the first selection time.

An immersion lithography apparatus that projects an image pattern onto a workpiece, the immersion lithography apparatus comprising:

• a reticle stage that retains a reticle;
• a working stage that retains the workpiece;
• a projection optical system including an illumination source and an optical element disposed opposite the workpiece for projecting the image pattern from the reticle onto the workpiece through the optical element, an exposure region being defined between the optical element and the workpiece;
• arrays of nozzles with openings proximally located to the exposure region, each of the nozzles alternately serving as a source nozzle and as a recovery nozzle;
• and
• a fluid controlling device that, during a first selection time, selects nozzles in one or more of the arrays on one or more of selected sides of the exposure region to be source nozzles and causes a liquid to be supplied through the source nozzles to be supplied into the exposure region such that the liquid contacts both the workpiece and the optical element for immersion lithography, the fluid controlling device selecting, during a second selection time that is different from the first selection time, nozzles to be recovery nozzles and causing liquid to be recovered from the exposure region through the recovery nozzles, the nozzles selected to be recovery nozzles during the second selection time being the same nozzles that were selected to be supply nozzles during the first selection time.

An apparatus comprising:

• a stage that holds a workpiece;
• a reticle stage that holds a reticle that defines an image;
• a projection system including an illumination source and an optical element, the projection system projecting the image defined by the reticle onto an exposure region on the workpiece, there being a gap between the optical element and the workpiece;
• one or more nozzles arranged adjacent to the gap, each of the one or more nozzles being alternately coupled to (i) a source of immersion liquid so as to provide the immersion liquid into the gap and (ii) a liquid collection portion so as to remove immersion liquid exiting the gap,
• wherein a given nozzle can function as both a source nozzle to provide the immersion liquid and as a recovery nozzle to recover the immersion liquid at alternate times.

A liquid supply and recovery system for an immersion lithography apparatus in which a pattern image is projected via an optical element and immersion liquid onto a workpiece located opposite the optical element, comprising:

• a first opening that is disposed adjacent to the optical element;
• and
• a second opening that is disposed adjacent to the optical element;
• wherein the first opening serves as a supply inlet to supply the immersion liquid from above the workpiece during a first time to fill a space between the optical element and the workpiece, and the second opening serves as a recovery outlet to recover the supplied immersion liquid during the first time, and wherein the first opening is connected to a vacuum source during a second time different from the first time.

An immersion lithography apparatus comprising:

• an optical element via which a pattern image is projected onto a workpiece through immersion liquid;
• a first opening that is disposed adjacent to the optical element;
• and
• a second opening that is disposed adjacent to the optical element;
• wherein the first opening serves as a supply inlet to supply the immersion liquid from above the workpiece during a first time to fill a space between the optical element and the workpiece, the second opening serves as a recovery outlet to recover the supplied immersion liquid during the first time, and wherein the first opening is connected to a vacuum source during a second time different from the first time.

A method of immersion lithography comprising:

• supplying immersion liquid from above a workpiece through a first opening during a first time to fill a space between an optical element and the workpiece;
• exposing the workpiece by projecting an image of a pattern via the optical element and the supplied immersion liquid onto the workpiece;
• recovering the supplied immersion liquid from a second opening during the first time;
• and
• providing a vacuum to the first opening by connecting the first opening to a vacuum source during a second time different from the first time.

A liquid supply and recovery system for an immersion lithography apparatus in which a pattern image is projected via an optical element and immersion liquid onto a workpiece located opposite the optical element, comprising:

• a first opening that is disposed adjacent to the optical element;
• a second opening that is disposed adjacent to the optical element;
• and
• a valve by which the first opening is selectively connected to a liquid source and a vacuum source,
• wherein the first opening is connected to the liquid source via the valve to supply the immersion liquid from above the workpiece through the first opening during a first time to fill a space between the optical element and the workpiece, and the supplied immersion liquid is recovered from the second opening during the first time, and wherein the first opening is connected to the vacuum source via the valve during a second time different from the first time.

An immersion lithography apparatus comprising:

• an optical element via which a pattern image is projected onto a workpiece through immersion liquid;
• a first opening that is disposed adjacent to the optical element;
• a second opening that is disposed adjacent to the optical element;
• and
• a valve by which the first opening is selectively connected to a liquid source and a vacuum source,
• wherein the first opening is connected to the liquid source via the valve to supply the immersion liquid from above the workpiece through the first opening during a first time to fill a space between the optical element and the workpiece, and the supplied immersion liquid is recovered from the second opening during the first time, and wherein the first opening is connected to the vacuum source via the valve during a second time different from the first time.