Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
AssigneeIntel Corporation
InventorsWang Yueh, Heidi Cao, Manish Chandhok
Life of this patent
Estimating the term…
Abstract
A series structure of a chemically amplified negative tone photoresist that is not based on cross-linking chemistry is herein described. The photoresist may comprise: a first aromatic structure copolymerized with a cycloolefin, wherein the cycloolefin is functionalized with a di-ol. The photoresist may also include a photo acid generator (PAG). When at least a portion of the negative tone photoresist is exposed to light (EUV or UV radiation), the PAG releases an acid, which reacts with the functionalized di-ol to rearrange into a ketone or aldehyde. Then new ketone or aldehyde is less soluble in developer solution, resulting in a negative tone photoresist.
Claims29
A photoresistive material comprising:
- a negative tone photoresist having at least a cycloolefin functionalized with a di-ol, wherein the di-ol comprises an alkyl bonded to the cycloolefin, the alkyl functionalized by two hydroxyl groups bonded to adjacent acyclical carbon atoms.
A negative tone photoresist comprising:
- a copolymerized structure represented by the following molecule
- where R1 is a hydrogen atom, an alkyl, or a hydroxyl, where each of R2, R3 and R4 is a hydrogen atom, alkyl, aromatic, and/or cage, and where X is no atom, a carbon atom, an alkyl, an oxygen atom, or a sulfur atom.
A method comprising:
- depositing a negative tone photoresist comprising a cycloolefin functionalized with a di-ol on an underlying layer, wherein the di-ol includes an alkyl bonded to the cycloolefin, the alkyl functionalized by two hydroxyl groups bonded to adjacent acyclical carbon atoms;
- and
- exposing at least a portion of the negative tone photoresist to radiation to form at least a carbonate containing material.
A photoresist comprising:
- a cycloolefin functionalized with a di-ol, the di-ol including an alkyl bonded to the cycloolefin, the alkyl functionalized by two hydroxyl groups bonded to adjacent acyclical carbon atoms, wherein the di-ol upon exposure to light, to undergo a pinacol rearrangement, wherein after the pinacol rearrangement the photoresist is less solulable in a developer solution.
Dependencies are inferred from the claim text.