Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted
AssigneeShinko Electric Industries Co., Ltd.
InventorsKazunari Sekigawa, Masatoshi Akagawa
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Abstract
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.
Claims9
An exposing method for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources, wherein a control step is included for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing, thereby a row of spots is irradiated with light, the interval of which is shorter than the distance covered by the relative movement of the substrate to be exposed during one period of the shortest turning-on controllable period of the light sources.
An exposing method, as set forth in step 3, wherein the control step controls so that the substrate to be exposed moves relatively with respect to the light sources at a speed covering the step size S per unit time when two or more step sizes S are set by the second setting step within the predetermined range.
Dependencies are inferred from the claim text.