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US 7,411,264 B2Granted
Etch-stop layers for patterning block structures for reducing thermal protrusion
AssigneeSeagate Technology LLC
InventorsMallika Kamarajugadda, Michael C. Kautzky, Stacy C. Wakham, David C. Seets, Arun Natarajun
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Abstract
The present invention provides a thin-film structure that includes an etch-stop layer having a first side and a second side, a patterned compensation layer for dissipating thermal energy, and an etch-vulnerable layer, where the etch-stop layer substantially impedes etching. The patterned compensation layer is adjacent the first side of the etch-stop layer, and the etch-vulnerable layer is adjacent the second side of the etch-stop layer.
Claims23
A thin-film structure comprising:
- an etch-stop layer comprising a first side and a second side;
- a patterned compensation layer for dissipating thermal energy, wherein the patterned compensation layer adjoins the first side of the etch-stop layer;
- and
- an etch-vulnerable layer adjacent the second side of the etch-stop layer;
- wherein the etch-stop layer substantially impedes etching;
- and
- wherein the patterned compensation layer is effective for reducing thermal pole-tip recession/protrusion in the thin-film structure.
4 more elements
A thin-film structure comprising:
- an etch-stop layer comprising a first side and a second side;
- a patterned compensation layer for dissipating thermal energy, wherein the patterned compensation layer adjoins the first side of the etch-stop layer;
- and
- an etch-vulnerable layer adjacent the second side of the etch-stop layer;
- wherein the etch-stop layer substantially impedes etching;
- and
- wherein the etch-vulnerable layer comprises a pole of a transducing head writer.
4 more elements
A thin-film structure comprising:
- a compensation layer patterned by etching and comprising a first side and a second side, wherein the compensation layer dissipates thermal energy from a metallic layer disposed adjacent the first side of the compensation layer;
- and
- an etch-stop layer comprising a first side and a second side, wherein the first side of the etch-stop layer adjoins the second side of the compensation layer for protecting an etch-vulnerable layer from etching while the compensation layer is being patterned, and wherein the etch-vulnerable layer is disposed adjacent the second side of the etch-stop layer.
Dependencies are inferred from the claim text.