US 7,411,203 B2 · EUV light source

Abstract

An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.

Claims32

Dependent claims

A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source having a drive laser producing a drive laser output pulse beam and a drive laser output pulse beam directing system and an EUV light collector having a collector focus, comprising:

a beam focusing system intermediate the beam directing system and the collector focus, operative to focus the output laser pulse beam to a selected position in the vicinity of the collector focus defining a selected plasma initiation site comprising a focusing lens and a reflective focusing element intermediate the focusing lens and the collector focus and having a focusing lens focal point intermediate the focusing lens and the reflective focusing element;
and the reflective focusing element focusing the beam at the selected position.

Dependencies are inferred from the claim text.

EUV light source

Life of this patent

EUV light source

Life of this patent

Abstract

Claims32