Crystallization method, crystallization apparatus, processed substrate, thin film transistor and display apparatus

A projection type crystallization method for a non-single-crystal semiconductor film, comprising:

• homogenizing pulse laser light by making the pulse laser beam incident on a homogenizer, in which the pulse laser beam is transformed into a plurality of light fluxes incident at different angles, and emitting pulse laser beam homogenized in light intensity by these plurality of light fluxes;
• modulating the pulse laser beam by making the plurality of the light fluxes of the different angles incident on a phase modulation optical system including a plurality of phase modulation sections to form a repetitious pattern in which the light intensity of the pulse laser beam homogenized in the homogenizing repeats a monotonous increase and a monotonous decrease, in a light intensity distribution in which maximum peaks of the light intensity of the repetitious pattern are equal to each other and so are minimum peaks, and emitting the modulated pulse laser beam therefrom;
• melting the non-single-crystal semiconductor film of an image-forming region, the image-forming region being formed as the pulse laser beam modulated in the modulating, forms an image on the laser beam incident surface by an image formation optical system;
• and
• crystallizing the image formation region melted with the pulse laser beam in a lateral direction.