Device fabrication by anisotropic wet etch

A method for fabricating a field effect device, comprising:

• producing a pedestal by forming a trench in a monocrystalline Si layer of a SOI wafer, said pedestal having a top surface and a plurality of sidewalls, wherein said top surface and said plurality of sidewalls are so oriented as to be substantially parallel with crystallographic planes of said layer of said SOI wafer, wherein said top surface is oriented to be substantially parallel with a {100}crystallographic plane of said layer of said SOI wafer;
• wet etching said pedestal with a mixture of water and ammonium hydroxide (NH4OH), wherein selecting the ratio of water to ammonium hydroxide to be between about 15:1 and about 200:1, and the temperature of said mixture to be between about 25° C. and about 70° C., wherein due to differing etch rates of crystallographic planes in said solution said plurality of sidewalls become faceted, wherein said faceting creates a reduced cross section segment on said pedestal;
• preventing said wet etching of said top surface by covering said top surface with a dielectric layer;
• preventing said wet etching of said plurality of sidewalls alongside a strip by covering said strip with a dielectric layer, wherein said strip borders said top surface;
• and
• in said reduced cross section segment, selecting a dopant concentration such that said reduced cross section segment is electrically conductive, wherein allowing for electrical continuity between said field effect device and said layer of said SOI wafer, wherein said field effect device is electrically coupled to said top surface;
• and
• completing fabrication of said field effect device.