Method for forming color filter
AssigneeUnited Microelectronics Corp.
InventorHsin-Ping Wu
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AssigneeUnited Microelectronics Corp.
InventorHsin-Ping Wu
Estimating the term…
A method for forming a color filter is provided. The method comprises steps of providing a substrate having a passivasion layer formed thereon. The substrate has at least one complementary metal-oxide semiconductor formed therein and the passivasion layer has at least trench formed therein in a peripheral region of the substrate. At least two adjacent color filter blocks are sequentially formed over the passivasion layer and the color filter blocks comprises a first color filter block and a second color filter block. The first color filter block and the second color filter block are disposed within a display region of the substrate. Moreover, the material for forming the first color filter, which is formed prior to the formation of the second color filter block, further fills the trench in the peripheral region simultaneously with a formation of the first color filter block.
A method of forming a color filter over a substrate having a display region and a peripheral region surrounding the display region, wherein the substrate has a passivasion layer formed thereon and the passivasion layer has at least one trench formed therein within the peripheral region, the method comprising:
A method for forming a color filter, comprising:
Dependencies are inferred from the claim text.