US 7,410,746 B2 · Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition

Abstract

The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical polymerization initiator of the present invention comprises a compound (a) having only one naphthalimide structure-containing group in one molecule. The radial generator of the present invention comprises a compound (c) having two or more naphthalimide structure-containing groups in one molecule and also functions as a crosslinking agent. A first photosensitive compound of the present invention comprises a compound (d) having a naphthalimide structure-containing group and an ethylenic unsaturated group in one molecule. A second photosensitive compound of the present invention comprises a polymer (e) of one or more radical polymerizable compounds containing the compound (d). A photosensitive resin composition according to the present invention contains, as an essential component, the above compound (a), compound (c), compound (d) or polymer (e).

Claims13

Dependent claims

A photoradical polymerization initiator comprising a compound (a) having only one naphthalimide structure-containing group represented by the following formula (2) in one molecule:

wherein R1, R2, R3, R4, R5 and R6 respectively represent a hydrogen atom or a substituent and may be bonded to each other to form a cyclic structure;
the chemical structure Q is a hydrocarbon group selected from a straight-chain and/or branched and/or cyclic saturated or unsaturated alkyl group, aryl group and allyl group;
and the hydrocarbon group Q may contain an atom other than carbon or hydrogen provided that he hydrocarbon group is directly bonded to nitrogen (N) via a carbon atom, wherein any one or more of R1, R2, R3, R4, R5 and R6 are not azo groups, and wherein the hydrocarbon group Q contains no cationic groups.

Dependencies are inferred from the claim text.

Facts

Application

10/396,206Filed 25 Mar 2003

Priority

JP 2002-09795629 Mar 2002

Published

US 2004/0023159 A15 Feb 2004

Granted

12 Aug 2008

Term ends

Not estimatedThe source records don’t support an estimate.

Classification9 codes

G03F 7/027
Photosensitive materials: non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/031
With photosensitivity-increasing substances, e.g. photoinitiators: organic compounds not covered by group G03F7/029
G03F 7/033
With binders: the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G03F 7/091
Characterised by structural details, e.g. supports, auxiliary layers: characterised by antireflection means or light filtering or absorbing means,…

Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition

Life of this patent

Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition

Life of this patent

Abstract

Claims13