Liquid crystal display panel and method of fabricating thereof

A method of fabricating a liquid crystal display panel, comprising:

• forming a gate electrode on a substrate;
• forming a gate insulating film on the gate electrode formed thereon;
• forming an amorphous silicon film on the gate insulating film;
• forming an insulating pattern on the amorphous silicon film;
• crystallizing the amorphous silicon film into a polycrystalline silicon film using a derivative metal, the polycrystalline silicon film having source, drain and channel areas, wherein the insulating pattern overlaps the channel area of the polycrystalline silicon film;
• and
• forming source and drain electrodes on the polycrystalline silicon film, wherein the source and the drain electrodes contacting the source and drain areas of the polycrystalline silicon film, respectively;
• wherein crystallizing the amorphous silicon film into a polycrystalline silicon film using a derivative metal further includes:
• forming the derivative metal on the insulating pattern and the amorphous silicon film;
• injecting an impurity ion into the amorphous silicon film having the derivative metal formed thereon;
• and
• applying a heat and an electric field to the amorphous silicon film, wherein the impurity ion injected into the amorphous silicon film is activated during the application of the heat;
• and
• wherein forming source and drain electrodes on the polycrystalline silicon film further includes:
• forming sequentially a data metal layer and the photo-resist on the polycrystalline film;
• forming a stepped photo-resist pattern with a mask having a partially exposing part:
• etching the data metal layer and the polycrystalline silicon film using the stepped photo-resist pattern;
• ashing the stepped photo-resist pattern;
• and
• etching the data metal layer using the ashed photo-resist pattern, thereby exposing the insulating pattern overlapping the channel area of the polycrystalline silicon film.