Polymer memory having a ferroelectric polymer memory material with cell sizes that are asymmetric
AssigneeIntel Corporation
InventorMark S. Isenberger
Life of this patent
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AssigneeIntel Corporation
InventorMark S. Isenberger
Estimating the term…
A polymer memory and its method of manufacture are provided. One multi-layer construction of the polymer memory has two sets of word lines and a set of bit lines between the word lines. The word lines of each set of word lines have center lines that are spaced by a first distance from one another, and the bit lines have center lines spaced by a second distance from one another, the second distance being less than the first distance. Three masking steps are required to manufacture the three layers of lines. Older-technology machinery and masks are used to form the two layers of word lines, and new-technology machinery and masks are used to manufacture the bit lines.
A method of manufacturing a polymer memory, comprising:
Dependencies are inferred from the claim text.