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US 7,407,738 B2Granted
Fabrication and use of superlattice
OwnerPavel Kornilovich, Peter Mardilovich +2inventors
InventorsPavel Kornilovich, Peter Mardilovich, James Stasiak, Niranjan Thirukkovalur
Life of this patent
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Abstract
This disclosure relates to a system and method for fabricating and using a superlattice. A superlattice can be fabricated by applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges. These exposed edges can be of nearly arbitrary length and curvature. These edges can be used to fabricate an array of nano-scale-width curved wires.
Claims49
A method for forming a superlattice comprising:
- forming a ridge aver a substrate surface, the ridge comprising sidewalk that are disposed substantially acutely relative to the substrate surface;
- applying alternating layers of two or more materials over the ridge;
- and
- removing part of the ridge and the alternating layers to expose edges of the alternating layers at the sidewalls of the ridge.
1 more element
A method comprising:
- applying an etchable surface layer over a substrate;
- applying a photoresist layer over the etchable surface layer of the substrate;
- exposing parts of the photoresist layer to radiation to create a pattern in the photoresist layer;
- removing an unpatterened portion of the photoresist layer;
- altering a slope of sidewalls of the patterned photoresist layer;
- and
- etching the photoresist layer and the etchable surface layer to remove the photoresist layer and portions of the etchable surface layer, leaving a sloped, patterned ridge of the etchable surface layer, wherein the sloped patterned ridge is geometrically similar to the sloped, patterned photoresist layer;
- applying alternating layers of two or more materials, one of the alternating layers having a thickness between one and one hundred nanometers, over the sloped, patterned ridge;
- and
- removing the alternating layers from a top of the sloped, patterned ridge to expose edges of the alternating layers at the sloped sidewalls of the sloped, patterned ridge.
7 more elements
A method comprising:
- applying alternating layers of two or more materials to a thickness between one and one hundred nanometers over a surface of a substrate having one or more non-linear ridges with substantially sloped side walls;
- and
- planarizing the ridges and the alternating layers to expose edges of the alternating layers at the side walls of the ridges.
A method comprising:
- shaping a surface layer on a substrate into an elongate ridge that extends along a long axis, the ridge being non-linear along the long axis and comprising a transverse cross section with substantially sloped sidewalls and a top;
- applying alternating layers of two or more materials to a thickness between one and one hundred nanometers over the ridge;
- and
- removing the alternating layers from the top of the ridge to expose edges of the alternating layers.
1 more element
A method comprising:
- applying alternating layers of a first material and a second material over a surface of a substrate having one or mare non-linear ridges with substantially sloped side walls;
- planarizing the ridges and the alternating layers to expose first edges of the first material layers and second edges of the second material layers at the side walls of the ridges to form a superlattice:
- processing the exposed edges to offset the first edges to corrugate the alternating layers of the first material:
- providing the superlattice having an array of co-parallel, curved corrugations between about one and one hundred nanometers wide;
- and
- forming an array of co-parallel, curved wires between about one and one hundred nanometers wide using the array of co-parallel, curved corrugations.
3 more elements
Dependencies are inferred from the claim text.