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US 7,407,635 B2Granted
Processes and apparatuses for treating halogen-containing gases
AssigneeBattelle Memorial Institute
InventorsGary B. Josephson, Delbert L. Lessor, Amit K. Sharma, Christopher Lyle Aardahl, Kenneth G. Rappe
Life of this patent
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Abstract
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.
Claims5
A plasma reactor apparatus, comprising:
- a chamber defining at least one first gas inlet for receiving a first gas, and at least one water inlet for receiving liquid water;
- at least one first electrode disposed within the chamber and defining a first surface that is in fluid communication with the water inlet for receiving liquid water, and at least one second gas inlet for receiving a second gas;
- an electrochemical cell that is in fluid communication with the second gas inlet;
- and
- at least one second electrode disposed within the chamber and opposing the first surface of the first electrode;
- wherein a dielectric barrier is disposed on at least one of the first surface of the first electrode or a surface of the second electrode.
3 more elements
Dependencies are inferred from the claim text.