Method of inspecting monocular diplopia and eye mark pattern for use in the same
OwnerMasahiro Hasegawainventor
Life of this patent
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Abstract
In order to examine a degree of monocular diplopia is easily examined in a quantitative manner, a plurality of circular eye marks are seen from a predetermined examination distance with a single eye of a patient to find a particular eye mark whose double vision images are observed to be circumscribed each other, and a degree of monocular diplopia is determined by a view angle of the relevant circular eye mark. Since the eye mark is formed as a circular pattern, a degree of monocular diplopia can be examined irrespective of an axial direction along which double vision images appear.
Claims17
A method of examining a degree of monocular diplopia of a patient, wherein a plurality of circular eye marks having different diameters are seen by a single eye of the patient to find a particular circular eye mark whose double vision images are observed to be circumscribed each other, and a degree of monocular diplopia of the patient is examined on a basis of a view angle of said particular circular eye mark.
An eye mark chart for use in a method of examining a degree of monocular diplopia in a quantitative manner in which a plurality of circular eye marks having different diameters are observed with a single eye a patient to find a particular circular eye mark whose diplopia vision images are observed to be circumscribed each other and a degree of monocular diplopia is determined as a view angle of the relevant particular eye mark, comprising an arrangement of a plurality of circular eye marks having different diameters, said circular eye marks forming a line in order of size.
Dependencies are inferred from the claim text.