Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorLevinus Pieter Bakker
Life of this patent
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Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the radiation beam is reflected from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam.
Claims30
A lithographic apparatus, comprising:
- a grazing incidence mirror configured to reflect a radiation beam to enhance a spectral purity of the radiation beam;
- an illumination system configured to condition the radiation beam;
- a support configured to support a patterning device, the patterning device being configured to impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table configured to hold a substrate;
- and
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein a first grazing incidence mirror is situated in a source-collector-module of the lithographic apparatus, a second grazing incidence mirror is situated in the illumination system of the lithographic apparatus and a third grazing incidence mirror in an intermediate focus of the lithographic apparatus.
A device manufacturing method, comprising:
- conditioning radiation beam using an illumination system;
- imparting a pattern to the radiation beam;
- projecting the patterned beam or radiation onto a target portion of a substrate, and reflecting the radiation beam from at least grazing incidence mirror that enhances the spectral purity of the radiation beam, wherein a first grazing incidence mirror is situated in a source-collector-module of a lithographic apparatus, a second grazing incidence mirror is situated in the illumination system of the lithographic apparatus and a third grazing incidence mirror in an intermediate focus.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate, wherein the radiation beam is reflected from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam, wherein a first grazing incidence mirror is situated in a source-collector-module of a lithographic apparatus, a second grazing incidence mirror is situated in an illumination system of the lithographic apparatus and a third grazing incidence mirror in an intermediate focus.
A device manufacturing method, comprising:
- providing a radiation beam using an illumination system;
- imparting a pattern to the radiation beam;
- projecting the pattern radiation beam onto a substrate;
- and
- reflecting the radiation beam from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam, wherein a first grazing incidence mirror is situated in a source-collector-module of a lithographic apparatus, a second grazing incidence mirror is situated in the illumination system of the lithographic apparatus and a third grazing incidence mirror in an intermediate focus.
Dependencies are inferred from the claim text.