Baking device and baking method of baking a chemically amplified resist film containing an acid (H+) generator before exposure but after development
AssigneeTokyo Electron Limited
InventorHiroyuki Iwaki
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Abstract
A heat treatment device for baking a chemically amplified resist film formed on a substrate after exposure but before development includes a table that supports the substrate, a heater that heats the substrate, a magnetic field generating unit that generates a magnetic field of lines of magnetic flux directed in a film thickness direction of the resist film and reverses the direction of the lines of magnetic flux, and a controller unit that controls the magnetic field generating unit to generate the magnetic field acting on the resist film at least while the substrate is being heated by the heater unit.
Claims16
A heat treatment device for baking a chemically amplified process material film containing an acid (H+) generator, the device comprising:
- a supporting unit that supports a substrate containing the process material film;
- a heating unit that heats the substrate supported by the supporting unit;
- a magnetic field generating unit that generates a magnetic field of lines of magnetic flux directed in a film thickness direction of the process material film and reverses the direction of the lines of magnetic flux in the magnetic field;
- and
- a control unit that controls the magnetic field generating unit to generate the magnetic field acting on the process material film at least while the substrate is being heated by the heating unit.
A heat treatment method of baking a chemically amplified process material film containing an acid (H+) generator before exposure but after development, the method comprising:
- (a) heating a substrate containing the process material film;
- and
- (b) generating a magnetic field of lines of magnetic flux directed in a film thickness direction of the process material film and reversing the direction of the lines of magnetic flux in the magnetic field, thereby making the magnetic field act on the process material film at least while the substrate is being heated by the heating unit.
Dependencies are inferred from the claim text.