Radiation system and lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsWilhelmus Josephus Box, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Hendrikus Gijsbertus Schimmel
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Abstract
The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.
Claims30
A radiation system for generating a beam of radiation comprising:
- an extreme ultraviolet radiation source constructed and arranged to generate extreme ultraviolet radiation;
- a contamination barrier constructed and arranged to trap contamination from said radiation source;
- and
- a temperature sensor constructed and arranged to measure a temperature of said contamination barrier.
A radiation system for generating a beam of radiation comprising:
- an extreme ultraviolet radiation source constructed and arranged to generate extreme ultraviolet radiation;
- a contamination barrier constructed and arranged to trap contamination from said radiation source;
- and
- a temperature control system constructed and arranged to control the temperature of said contamination barrier.
A lithographic apparatus comprising:
- a radiation system constructed and arranged to generate a beam of radiation, said radiation system comprising
- an extreme ultraviolet radiation source constructed and arranged to generate extreme ultraviolet radiation;
- a contamination barrier constructed and arranged to trap contamination from said radiation source;
- and
- a temperature sensor constructed and arranged to measure a temperature of said contamination barrier;
- a patterning device constructed and arranged to pattern the beam of radiation;
- and
- a projection system constructed and arranged to project the patterned beam of radiation onto a substrate.
Dependencies are inferred from the claim text.