Exposure apparatus and exposure method
AssigneeShinko Electric Industries Co., Ltd.
InventorsTakahiro Inoue, Hiroaki Samizu
Life of this patent
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Abstract
An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means for adjusting the amount of light to be projected from two adjacent exposure heads onto the overlapping exposed area so that the amount of the projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if the exposure area were to be exposed through the same pattern by the single exposure head alone.
Claims12
An exposure apparatus for performing direct exposure on a relatively moving exposure target, comprising:
- a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on said exposure target as a result of exposure by said exposure heads;
- and
- light adjusting means for adjusting the amount of light to be projected from two adjacent ones of said exposure heads onto said overlapping exposed area so that the amount of said projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if said exposure area were to be exposed through the same pattern by said single exposure head alone,
- wherein each of said exposure heads is constructed from a digital micromirror device, and said light adjusting means is disposed between said exposure target and said exposure heads, and is constructed from a filter capable of adjusting the transmittance of light being projected from said exposure heads toward said exposure target.
An exposure apparatus for performing direct exposure on a relatively moving exposure target, comprising:
- a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on said exposure target as a result of exposure by said exposure heads;
- and
- light adjusting means for adjusting the amount of light to be projected from two adjacent ones of said exposure heads onto said overlapping exposed area so that the amount of said projected light will yield an exposure result equivalent to the result that would be obtained from a single exposure head if said exposed area were to be exposed by said single exposure head alone,
- wherein each of said exposure heads is constructed from a digital micromirror device, and said light adiusting means is disposed between said exposure target and said exposure heads, and is constructed from a filter capable of adjusting the transmittance of light being projected from said exposure heads toward said exposure target.
An exposure apparatus for performing direct exposure on a relatively moving exposure target, comprising:
- a plurality of exposure heads arranged so that an overlapping exposed area occurs as a result of exposure by two adjacent ones of said exposure heads;
- and
- light adjusting means for adjusting the amount of light to be projected from said two exposure heads onto said overlapping exposed area so that the amount of said projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if said exposure area were to be exposed through the same pattern by said single exposure head alone,
- wherein each of said exposure heads is constructed from a digital micromirror device, and said light adjusting means is disposed between said exposure target and said exposure heads, and is constructed from a filter capable of adjusting the transmittance of light being projected from said exposure heads toward said exposure target.
An exposure method for performing direct exposure on a relatively moving exposure target, wherein using a plurality of exposure heads arranged so that an overlapping exposed area occurs between adjacent exposed areas after exposure, light is projected onto said exposure target by adjusting the amount of light to be projected from two adjacent ones of said exposure heads onto said overlapping exposed area so that the amount of said projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if said exposure area were to be exposed by said single exposure head alone,
- wherein each of said exposure heads is constructed from a digital micromirror device, and said light adjusting means is disposed between said exposure target and said exposure heads, and is constructed from a filter capable of adjusting the transmittance of light being projected from said exposure heads toward said exposure target.
Dependencies are inferred from the claim text.