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US 7,397,534 B2Granted
Exposure apparatus and device manufacturing method
AssigneeNikon Corporation
InventorsNaohiko Iwata, Hideaki Sakamoto, Masaya Iwasaki, Ken Hattori, Masato Takahashi, Yutaka Endo, Yasuo Araki
Life of this patent
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Abstract
The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.
Claims14
An exposure apparatus comprising:
- a projection optical system that irradiates exposure light emitted from a mask onto a substrate;
- a first support member that supports the projection optical system;
- a vibration suppression device that actively suppresses vibration of the first support member;
- and
- a support structure that supports the first support member via the vibration suppression device,
- wherein a position at which the vibration suppression device supports the first support member is higher than a position at which the first support member supports the projection optical system, and the vibration suppression device eliminates vibration in a height direction.
3 more elements
An exposure apparatus comprising:
- a projection optical system that irradiates exposure light emitted from a mask onto a substrate;
- a mask stage that retains the mask;
- a first support member that supports the projection optical system;
- a second support member that supports the mask stage;
- a vibration suppression device that suppresses vibration of the first support member;
- and
- a support structure that supports the first support member via the vibration suppression device,
- wherein a position at which the vibration suppression device supports the first support member is higher than a position at which the first support member supports the projection optical system, the first support member includes an arch shape, and the second support member includes an inverse arch shape relative to the arch shape of the first support member.
5 more elements
Dependencies are inferred from the claim text.