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US 7,397,531 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorDominicus Jacobus Petrus Adrianus Franken
Life of this patent
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AssigneeASML Netherlands B.V.
InventorDominicus Jacobus Petrus Adrianus Franken
Estimating the term…
A lithographic apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the patterning device, or the projection system, and the illumination system includes a reflector assembly that includes a reflector substrate with a reflective surface for reflecting part of incident radiation, and a heat exchanger system that is constructed and arranged to exchange heat with the reflector substrate. The heat exchanger system includes a thermally active element that is disposed in a recess of the reflector substrate at a side of the reflector substrate that is different from the reflective surface.
A lithographic apparatus comprising:
A reflector assembly for a lithographic apparatus, the reflector assembly comprising:
A heat exchanger system arranged for use in a reflector assembly of a lithographic apparatus, said heat exchanger system comprising a thermally active element positionable in a recess in a backside of a reflector substrate, the reflector substrate having a reflective surface for reflecting part of incident radiation, said backside of the reflector substrate being opposite the reflective surface.
A device manufacturing method comprising:
A lithographic apparatus comprising:
Dependencies are inferred from the claim text.