Lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsJohannes Cornelis Driessen, Hermanus Mathias Joannes Rene Soemers, Michael Jozefa Mathijs Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken
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Abstract
A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.
Claims19
A lithographic projection apparatus comprising:
- a radiation system for providing a projection beam of radiation;
- a first object table for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern;
- a second object table for holding a first substrate;
- a third object table for holding a second substrate;
- a vacuum chamber with a first gas evacuator for generating a vacuum beam path for the projection beam;
- a projection system for projecting the patterned beam onto a target portion of one of the first and second substrates;
- and
- a plurality of conduit conducts for providing utilities to the second and third object tables via conduits, the conduit conducts being moveable in at least one degree of freedom in said vacuum chamber so as to allow the second and third object tables to exchange positions within the vacuum chamber.
A device manufacturing method using a lithographic apparatus, the method comprising:
- providing a vacuum to a vacuum chamber;
- providing substrates that are at least partially covered by a layer of radiation-sensitive material to second and third object tables;
- providing utilities through conduits to the second and third object tables moveable in at least a first direction in the vacuum chamber;
- protecting the conduits with a conduit conduct from the vacuum in the vacuum chamber;
- projecting a projection beam of radiation using a radiation system through said vacuum chamber;
- patterning the projection beam of radiation with a pattern in its cross-section;
- projecting the patterned projection beam of radiation onto a target portion of the layer of radiation-sensitive material;
- exchanging the second and third object tables from two different areas within the vacuum;
- and
- allowing the conduit conducts to follow positions of the second and third object tables.
A lithographic projection apparatus comprising:
- a first object table for supporting a patterning device, the patterning device serving to pattern a projection beam of radiation;
- a second object table for holding a first substrate;
- a third object table for holding a second substrate;
- a vacuum generator for generating a vacuum beam path for the projection beam within a vacuum chamber;
- a projection system for projecting the patterned beam onto a target portion of one of the first and second substrates;
- and
- a plurality of pipes for providing utilities to the second and third object tables via conduits, the pipes being moveable in at least one degree of freedom in said vacuum chamber so as to allow the second and third object tables to exchange positions within the vacuum chamber.
Dependencies are inferred from the claim text.