Photomask reticle having multiple versions of the same mask pattern with different biases
AssigneePhotronics, Inc.
InventorsBarry K. Rockwell, Jeffrey W. Tracy, Edward Vokoun
Life of this patent
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Abstract
A reticle includes at least two duplicate mask patterns each having a different bias. A reticle according to at least one embodiment of the invention includes a first mask pattern, a second mask pattern and a third mask pattern, each of the first mask pattern, second mask pattern and third mask pattern being duplicates of one another and having a different bias.
Claims23
A reticle comprising a first mask pattern, a second mask pattern and a third mask pattern, each of the first mask pattern, second mask pattern and third mask pattern being duplicates of one another and having a different bias.
A reticle comprising at least two duplicate mask patterns each having a different bias.
A reticle comprising a first set of a plurality of duplicate mask patterns and a second set of a plurality of duplicate mask patterns, each of the mask patterns in each set having a different bias.
A method of forming a recticle comprising the steps of:
- providing a blank reticle;
- and
- forming at least two duplicate mask patterns in the blank reticle, each of the at least two duplicate mask patterns having a different bias.
A method of forming a semiconductor layer of a semiconductor device comprising the steps of:
- interposing a reticle between an energy source and a semiconductor wafer, the reticle comprising at least two duplicate mask patterns each having a different bias;
- and
- passing energy through one of the at least two duplicate mask patterns using the energy source to form an image on the semiconductor wafer, the one of the at least two duplicate mask patterns being chosen based on a required bias.
The method of 19, wherein the at least two duplicate mask patterns comprises a first mask pattern, a second mask pattern and a third mask pattern, each of the first mask pattern, second mask pattern and third mask pattern having a different bias.
Dependencies are inferred from the claim text.