Process for removing particles from reticle
AssigneePowerchip Semiconductor Corp.
InventorsPo-Ching Lin, Yu-Cheng Yang
Life of this patent
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Abstract
A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particle removing tool includes at least one gas spray member directed toward a surface of the reticle for removing particles. The process includes steps as follows, step (a) loading the reticle into the PPD through the gas spray member to detect whether the reticle has particles thereon; step (b) ejecting the reticle from the PPD; step (c) turning on the particle removing tool as well as going back to step (a) when particles are detected on the reticle, and ending the particle removal process when no particle is detected on the reticle.
Claims4
A process, for removing particles from a reticle using a pellicle particle detector and a particle removing tool disposed in front of the pellicle particle detector as well as fixed to the pellicle particle detector, the particle removing tool including at least one gas spray member directed toward a surface of the reticle for removing particles, the process comprising:
- step (a) loading the reticle into the pellicle particle detector through the gas spray member to detect whether the reticle has particles thereon;
- step (b) ejecting the reticle from the pellicle particle detector;
- and
- step (c) turning on the particle removing tool when particles are detected on the reticle, and going back to step (a);
- and ending the particle removal process when no particle is detected on the reticle.
Dependencies are inferred from the claim text.