Method for fabricating a Johnsen-Rahbek electrostatic wafer clamp

A J-R electrostatic clamp for clamping a wafer, the electrostatic clamp comprising:

• a J-R type ceramic layer having a clamping surface whereon the wafer resides and a backside surface generally opposite the clamping surface;
• a plurality of electrically conductive electrodes arranged across the backside surface of the ceramic layer in a predetermined manner, the plurality of electrodes being distributed about an interior region and a peripheral region of the backside surface, wherein each electrode in the interior region is associated with a respective one or more electrodes in the peripheral region, wherein a plurality of electrode groups are generally defined;
• a first insulating layer formed over and between the plurality of electrode groups, wherein the first insulating layer generally electrically isolates the plurality of electrode groups from one another;
• and
• an interconnect layer comprising a plurality of electrically conductive vias and interconnects, wherein the plurality of vias generally extend through the first insulating layer and electrically connect to each of the plurality of electrodes, wherein the plurality of interconnects are formed over the first insulating layer and electrically connect the vias associated with each electrode group, wherein the plurality of electrode groups are electrically isolated from one another, and wherein the interconnect layer further comprises a plurality of connection nodes, wherein each connection node is respectively electrically connected to each electrode group, wherein each node is operable to electrically connect to a respective voltage potential.