Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading means
AssigneeSeiko Epson Corporation
InventorChiharu Iriguchi
Life of this patent
Estimating the term…
Abstract
An aligner to expose any exposure area includes an exposure light source that emits an exposure beam having a specified width to expose the exposure area to light; a douser having a width corresponding to at least the width of the exposure beam; and a shading unit to prevent the exposure beam from reaching an area other than the exposure area by driving the douser to shut off part or all of the exposure beam. The aligner is capable of forming different exposure areas with high density and having a structure suitable to reduce the size of the entire unit.
Claims14
An aligner to expose an exposure area to light, comprising:
- a stage having a mount surface to hold an exposure substrate having a photosensitive film with a surface facing a hologram recording surface of a hologram mask;
- a light-emitting device that emits an exposure beam having a specified width to expose the exposure area to light;
- a douser having a width corresponding to at least the width of the exposure beam;
- and
- a drive unit to prevent the exposure beam from reaching an area other than the exposure area by driving the douser to shut off part or all of the exposure beam;
- and
- a range-finding optical system that adjusts a distance between the hologram recording surface and the photosensitive film surface.
An aligner to expose an exposure area to light, comprising:
- a stage having a mount surface to hold an exposure substrate having a photosensitive film with a thickness;
- a light-emitting device that emits an exposure beam having a specified width to expose the exposure area to light;
- a douser having a width corresponding to at least the width of the exposure beam;
- a drive unit to prevent the exposure beam from reaching an area other than the exposure area by driving the douser to shut off part or all of the exposure beam;
- and
- a film-thickness measuring optical system that measures the thickness of the photosensitive film.
Dependencies are inferred from the claim text.