Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorMakoto Nomoto
Life of this patent
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Abstract
An exposure apparatus configured to expose a substrate to light via a reticle. The apparatus includes a projection optical system configured to project a pattern of the reticle onto the substrate, a nozzle configured to supply liquid to a region between the projection optical system and the substrate where the light passes, and a circulation system configured to circulate liquid to be supplied to the nozzle. The circulation system includes (i) a tank configured to store an externally supplied liquid, (ii) a first flow path configured to supply liquid from the tank to the nozzle, (iii) a thermoregulator configured to thermoregulate a temperature of liquid in the first flow path, and (iv) a second flow path configured to supply liquid to the tank from a branched point of the first flow path between the nozzle and the thermoregulator.
Claims12
An exposure apparatus configured to expose a substrate to light via a reticle, said apparatus comprising:
- a projection optical system configured to project a pattern of the reticle onto the substrate;
- a nozzle configured to supply liquid to a region, between said projection optical system and the substrate, where the light passes;
- and
- a circulation system configured to circulate liquid to be supplied to said nozzle, wherein said circulation system includes:
- (i) a tank configured to store an externally supplied liquid;
- (ii) a first flow path configured to supply liquid from said tank to said nozzle;
- (iii) a thermoregulator configured to thermoregulate a temperature of liquid in said first flow path;
- and
- iv) a second flow path configured to supply liquid to said tank from a branched point of said first flow path between said nozzle and said thermoregulator.
Dependencies are inferred from the claim text.