Lithographic apparatus, projection apparatus and device manufacturing method

A lithographic apparatus comprising:

• a projection system configured to project a patterned radiation beam, said patterned radiation beam being imparted by a patterning device being supported on a patterning device support,
• wherein said lithographic apparatus comprises a control system configured to control a position of said patterning device support, said control system comprising:
• a first detection device configured to generate a projection system position signal representative of a position of the projection system,
• a second detection device configured to generate a projection system feed-forward signal,
• a comparative unit configured to generate a servo error signal by subtracting a signal representative of an actual patterning device support position from a patterning device support position reference signal and adding the projection system position signal,
• a control unit configured to generate a first control signal on the basis of said servo error signal,
• an addition unit configured to generate a second control signal by adding said projection system feed-forward signal and said first control signal, and
• an actuator unit configured to actuate said patterning device support to a desired patterning device support position on the basis of said second control signal,
• wherein said control system further comprises a projection system position signal filter unit configured to filter said projection system position signal before adding said projection system position signal to the reference patterning device support position signal.

A projection apparatus comprising a control system configured to control a position of a first component, on the basis of a first component reference signal and a position of a second component, said control system comprising:

• a first detection device configured to generate a second component position signal representative of the position of the second component,
• a second detection device configured to generate a second component feed-forward signal,
• a comparative unit configured to generate a servo error signal by subtracting a signal representative for an actual first component position from a first component position reference signal and adding the second component position signal,
• a control unit configured to generate a first control signal on the basis of said servo error signal,
• an addition unit configured to generate a second control signal by adding said second component feed-forward signal and said first control signal, and
• an actuator unit configured to actuate said first component to a desired first component position on the basis of said second control signal,
• wherein said control system further comprises a second component position signal filter unit configured to filter said second component position signal before adding said second component position signal to the reference first component position signal.

A device manufacturing method comprising using a projection system for projecting a patterned beam of radiation, said pattern being imparted by a patterning device, said patterning device being supported on a patterning device support,

• wherein a control system configured to control the position of said patterning device support is used,
• wherein a projection system position signal representative for a position of said projection system is added to the difference between a patterning device support position reference signal and an actual patterning device support position resulting in a servo error signal which is used as an input for a control unit,
• wherein in a feed-forward branch a projection system feed-forward signal is added to a first control signal of said control unit resulting in a second control signal,
• wherein said second control signal is used to actuate said patterning device support to a desired patterning device support position, and
• wherein said projection system position signal is filtered by a projection system position signal filter unit before being added to said difference between said patterning device support position reference signal and said actual patterning device support position.

A device manufacturing method comprising using a projection apparatus:

• wherein a control system is used, said control system being configured to control a position of a first component on the basis of a first component reference signal and a position of a second component,
• wherein a second component position signal representative for a position of said second component is added to the difference between a first component position reference signal and an actual first component position resulting in a servo error signal which is used as an input for a control unit,
• wherein in a feed-forward branch a projection system feed-forward signal is added to a first control signal of said control unit resulting in a second control signal,
• wherein said second control signal is used to actuate said first component to a desired first component position, and
• wherein said second component position signal is filtered by a second component position signal filter unit before being added to said difference between said first component position reference signal and said actual first component position.