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US 7,352,435 B2Granted
Lithographic apparatus and device manufacturing method
AssigneesASML Netherlands B.V., Carl Zeiss SMT GmbH
InventorsBob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
Life of this patent
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Abstract
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Claims22
A lithographic apparatus, comprising:
- an illumination system configured to condition a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device configured to impart the beam with a pattern in its cross-section;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a liquid supply system configured to fill a space between the projection system and the substrate with a liquid;
- and
- a beam controller configured to focus the patterned beam at a plurality of positions, along a direction substantially parallel to an optical axis of the projection system, relative to the substrate during projection of the patterned beam.
4 more elements
A device manufacturing method, comprising:
- providing a liquid to a space between a projection system of a lithographic apparatus and a substrate;
- projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate;
- and
- focusing the patterned beam of radiation at a plurality of positions, along a direction substantially parallel to an optical axis of the projection system, relative to the substrate during projection of the patterned beam.
1 more element
Dependencies are inferred from the claim text.