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US 7,352,433 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsChristiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
Life of this patent
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Abstract
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
Claims35
A lithographic apparatus, comprising:
- an illumination system configured to condition a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid;
- and
- a gas flow port configured to create a flow of gas to at least confine humid gas in a space above and in contact with the liquid.
4 more elements
A device manufacturing method, comprising:
- providing a liquid to a space between a projection system and a substrate;
- flowing a gas in a space above and in contact with the liquid to at least confine humid gas in the space;
- and
- projecting a patterned beam of radiation using the projection system onto a target portion of the substrate through the liquid.
1 more element
A lithographic apparatus, comprising:
- an illumination system configured to condition a beam of radiation;
- a support structure configured to hold a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid;
- a gas flow port configured to create a flow of gas to at least confine humid gas in a space above and in contact with the liquid;
- and
- a passage through which the flow of gas flows formed at least partly by the projection system and the gas flow port.
5 more elements
Dependencies are inferred from the claim text.