Back to results
US 7,351,503 B2Granted
Fused silica pellicle in intimate contact with the surface of a photomask
AssigneePhotronics, Inc.
InventorBen Eynon
Life of this patent
Estimating the term…
Abstract
A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask.
Claims25
A photomask comprising:
- (a) a substantially transparent photomask substrate,
- (b) a patterned area of masking material affixed to said photomask substrate, and
- (c) a fused silica pellicle affixed to said patterned area of masking material.
An embedded-attenuated phase shift photomask comprising:
- (a) a substantially transparent photomask substrate;
- (b) a phase shift layer affixed to said photomask substrate;
- (c) a patterned area of masking material affixed to said phase shift layer;
- and
- (d) a fused silica pellicle affixed to said patterned area of masking material.
2 more elements
An alternating aperture phase shift mask comprising:
- (a) a patterned area of a substantially transparent photomask substrate,
- (b) a patterned area of masking material affixed to said photomask substrate, wherein said patterned area of said substantially transparent photomask substrate alternates with said patterned area of said masking material, and
- (c) a fused silica pellicle affixed to said patterned area of masking material.
A photomask comprising:
- (a) a substantially transparent photomask substrate,
- (b) a patterned area of masking material affixed to said photomask substrate,
- (c) a planarization layer affixed to the top surface of said patterned area of masking material, and
- (d) a fused silica pellicle affixed to said planarization layer.
1 more element
Dependencies are inferred from the claim text.