Method for producing a mask layout avoiding imaging errors for a mask

A method for producing a final mask layout for a mask, the method comprising:

• producing a provisional auxiliary mask;
• forming a modified auxiliary mask layout with the provisional auxiliary mask layout by arranging at least one optically non-resolvable auxiliary structure between two mask structures of the provisional auxiliary mask layout, the optically non-resolvable auxiliary structure being positioned between the two mask structures in a manner dependent on a structure size of the two mask structures, an eccentric offset of the optically non-resolvable auxiliary structure between the two mask structures being effected in the case of differing structure sizes of the two mask structures;
• and
• converting the modified auxiliary mask layout into the final mask layout with the aid of an OPC method,
• wherein a distance between the two mask structures is additionally taken into account when predefining the eccentric offset, and wherein the optically non-resolvable auxiliary structure is asymmetrically located relative to a central axis separating the two mask structures.