Active edge grip rest pad

A rest pad for supporting a workpiece seated on an end effector, comprising:

• a support pad having a proximal end and a distal end, a support surface, and a central axis extending from the proximal end to the distal end, said support surface including an inclined surface that transitions to a substantially flat surface at said distal end;
• and
• an edge stop pad having a wafer contact surface, said edge stop pad being located adjacent to said distal end of said support pad so that said central axis of said support pad does not intersect said wafer contact surface,
• wherein the support pad and the edge stop are maintained in fixed positions on the rest pad, and the wafer contact surface and the support pad remain proximal to each other to restrain the workpiece.

A rest pad for supporting a workpiece, the rest pad being mounted to an end effector, comprising:

• a support pad having a proximal end, a distal end, and a support surface, said support surface including an inclined surface that transitions to a substantially flat surface at said distal end and said support pad includes a first protrusion and a second protrusion extending from a bottom surface of said support pad;
• and
• an edge stop having a wafer contact surface, said edge stop being located adjacent to said distal end of said support pad,
• wherein an imaginary vertical plane passing through a central axis of said support pad does not intersect said wafer contact surface of said edge stop, said central axis extending between said proximal end and said distal end of said support pad.

A rest pad for supporting a workpiece seated on an end effector, comprising:

• a support pad having a proximal end and a distal end, a support surface, and a central axis extending from the proximal end to the distal end, said support surface including an inclined surface that transitions to a substantially flat surface at said distal end;
• and
• an edge stop pad having a wafer contact surface, said edge stop pad being located adjacent to said distal end of said support pad so that said central axis of said support pad does not intersect said wafer contact surface,
• wherein said support pad includes a first protrusion and a second protrusion extending from a bottom surface of said support pad.