Enhanced lithographic resolution through double exposure

A device manufacturing method with a lithographic system, the method comprising:

• providing a substrate coated with a photoresist layer having reduced memory reaction characteristics;
• providing a beam radiation;
• employing a patterning device to impart said beam of radiation with a pattern in its cross-section in which said pattern is decomposed into at least two constituent sub-patterns;
• exposing a first of said at least two constituent sub-patterns by directing said beam of radiation beam through said first sub-pattern such that said lithographic system produces a first sub-pattern image onto a target area of said pre-specified photoresist layer of said substrate;
• processing said exposed substrate;
• exposing a second of said at least two constituent sub-patterns by directing said beam of radiation through said second sub-pattern such that said lithographic system produces a second sub-pattern image onto said target area of said pre-specified photoresist layer of said substrate,
• wherein said exposing of the first of said at least two constituent sub-patterns and said exposing of the second of said at least two constituent sub-patterns combine said first and second sub-pattern images to produce a desired pattern on said target area of said substrate.