Projection exposure apparatus, device manufacturing method, and sensor unit
AssigneeCanon Kabushiki Kaisha
InventorTakahiro Akamatsu
Life of this patent
Estimating the term…
Abstract
A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system. The apparatus includes a sensor unit which includes a light-receiving element for detecting light incident through the projection optical system, a vessel in which the light receiving element is arranged, a sealing window which transmits the incident light and seals the vessel, and a driving mechanism which aligns the substrate. A space between the sealing window and the light-receiving element is filled with a liquid having a refractive index which is greater than one, and the liquid also serves as a coolant for cooling the driving mechanism.
Claims6
A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system, said apparatus comprising:
- a sensor unit which comprises a light-receiving element for detecting light incident through the projection optical system;
- a vessel in which said light-receiving element is arranged;
- a sealing window which transmits the incident light and seals said vessel;
- and
- a driving mechanism which aligns the substrate,
- wherein a space between said sealing window and said light-receiving element is filled with a liquid having a refractive index which is greater than one, and the liquid also serves as a coolant for cooling said driving mechanism.
Dependencies are inferred from the claim text.