Lithographic apparatus and device manufacturing method

A carousel for use in a lithographic apparatus that comprises an illumination, patterning, and projection system that patterns a beam of radiation and projects the patterned beam onto a target portion of a substrate and a metrology system adjacent the projection system that ensures the substrate is aligned with the projection system, the carousel comprising:

• two or more chucks, each arranged to support a corresponding one of the substrates;
• and
• a loading device that places the substrates onto the chucks;
• wherein the chucks are independently movable, so that one of the substrates is passed through the metrology system and the patterned beam, while another one of the substrates is moved between a loading system and the projection system.

A device manufacturing method, comprising:

• patterning a beam of radiation provided by a illumination system using a patterning device;
• providing two or more movable chucks, each arranged to support a corresponding substrate;
• aligning a first one of the substrates with a projection system using a metrology system adjacent the projection system;
• projecting the patterned beam onto a target portion of a first one of the substrates with the projection system;
• placing the substrates onto the chucks using a loading device;
• and independently moving a second one of the substrates between the loading device and the projection system, while the patterned beam is projected onto the first substrate.