Doubly asymmetric double gate transistor structure

A double gated field effect transistor comprising:

• a) a transistor body, the transistor body formed from a silicon layer formed above an insulator layer, the transistor body having a first vertical edge and a second vertical edge, the transistor body having a first end and a second end, the transistor body first edge and the transistor body second edge being opposite each other and substantially perpendicular to the insulator layer;
• b) a first gate dielectric layer formed on the transistor body first edge;
• c) a second gate dielectric layer formed on the transistor body second edge;
• d) a weak gate structure having a first workfunction formed on the first gate dielectric layer adjacent to the transistor body first edge;
• e) a first spacer adjacent a first side of the weak gate structure and a second spacer adjacent a second side of the of the weak gate structure;
• f) a strong gate structure having a second workfunction formed on the second gate dielectric layer adjacent to the transistor body second edge;
• and
• g) a source implant at the first end of the transistor body and a drain implant at the second end of the transistor body, and wherein the strong gate structure overlaps the source and drain implants and wherein the weak gate structure does not overlap the source or drain implants.