Apparatus for integrated monitoring of wafers and for process control in semiconductor manufacturing and a method for use thereof

An integrated apparatus for monitoring semiconductor wafer and for process control in the semiconductor production process by means at least two different measurements, comprising a measuring unit for performing said measurements in predetermined sites on said wafer, at least one illumination source for illuminating said wafer, supporting means for holding, rotating and translating the wafer and a control unit connected to said measuring unit, to said supporting means and to said illumination source,

• wherein said measuring unit comprises at least two fixed-relative-to-each-other measuring sub-units spatially separated along a wafer translating axis, at least one of the sub-units being a substantially normal-incidence optical measuring sub-unit comprising an image acquisition assembly and an autofocusing assembly.