Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method

An exposure method comprising the steps of:

• calculating a wave front aberration of a target optical system using a measuring method;
• adjusting the target optical system based on the wave front aberration of the target optical system, which is calculated in said calculating step;
• and
• exposing an object using the target optical system adjusted in said adjusting step,
• wherein said measuring method measures wave front of light, which has passed through the target optical system, said measuring method comprising the steps of:
• (i) dividing light that passes the target optical system into a first wave front and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction;
• (ii) obtaining information concerning an interference fringe using shearing interference with divided light;
• (iii) calculating a differential wave front between the first wave front and the second wave front by using the information concerning the interference fringe obtained in said obtaining step;
• and
• (iv) correcting the differential wave front based on the predetermined amount and a wave number in the predetermined direction.