Exposure method and exposure system
AssigneeFUJIFILM Corporation
InventorsTakao Ozaki, Takayuki Uemura, Yoji Okazaki, Norihisa Takada, Yuji Shimoyama, Daisuke Nakaya, Katsuto Sumi, Morimasa Sato, Mitsutoshi Tanaka
Life of this patent
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Abstract
Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.
Claims37
An exposure method for projecting light modulated by a spatial light modulator element onto photosensitive material, thereby exposing the photosensitive material in a predetermined pattern, the method comprising controlling an action of the spatial light modulator element so that an amount of the light projected onto the photosensitive material is changed in at least two stages according to a part of the photosensitive material, whereby a plurality of exposed areas different from each other in an amount of the light to which an exposed area of the plurality of exposed areas is exposed in at least two stages can be formed in the photosensitive material.
An exposure system for projecting light modulated by a spatial light modulator element onto photosensitive material, thereby exposing the photosensitive material in a predetermined pattern, the system comprising an exposure control means which controls an action of the spatial light modulator element so that an amount of the light projected onto the photosensitive material is changed in at least two stages according to a part of the photosensitive material, whereby a plurality of exposed areas different from each other in an amount of the light to which an exposed area of the plurality of exposed areas is exposed in at least two stages can be formed in the photosensitive material.
An exposure method for projecting light modulated by a spatial light modulator element onto photosensitive material, thereby exposing the photosensitive material in a predetermined pattern, the method comprising controlling an action of the spatial light modulator element so that an amount of the light projected onto the photosensitive material is changed in at least two stages according to a part of the photosensitive material, whereby a plurality of exposed areas different from each other in an amount of the light to which an exposed area of the plurality of exposed areas is exposed in at least two stages can be formed in the photosensitive material, wherein dots of the light traveling through a plurality of pixels in a sub-scanning direction are projected onto the photosensitive material, and an amount of light exposing the photosensitive material is changed by thinning the dots.
Dependencies are inferred from the claim text.