Lithographic apparatus and device manufacturing method

A device manufacturing method, comprising:

• providing a beam of radiation of radiation using an illumination system;
• patterning the beam of radiation;
• projecting the patterned beam of radiation onto a target portion of a substrate at least partially covered by a layer of radiation sensitive material using a projection system;
• positioning a stop disc adjacent a focusing element of the illumination system or the projection system using a disc positioner so that the beam of radiation passes through an aperture in the stop disc;
• removing the stop disc from its position adjacent the focusing element using the disc positioner;
• and
• replacing the stop disc with a further stop disc using a disc changer to supply the further stop disc to the disc positioner, the disc changer being external to the focusing element,
• wherein the disc changer and the focusing element are enclosed in a vacuum.

A lithographic apparatus, comprising:

• an illumination system configured to provide a beam of radiation;
• a support configured to support a patterning device, the patterning device configured to impart a pattern to the beam of radiation;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate and comprising a focusing element to reflect the beam of radiation;
• a disc positioner configured to place a stop disc adjacent the focusing element so that the beam of radiation passes through an aperture in the stop disc;
• and
• a disc changer configured to select the stop disc from a plurality of stop discs and supply the selected stop disc to the disc positioner, the disc changer being external to the projection system, the disc changer and the projection system, in use, enclosed within a vacuum.

A device manufacturing method, comprising:

• providing a beam of radiation using an illumination system;
• patterning the beam of radiation;
• projecting the patterned beam of radiation onto a target portion of a substrate at least partially covered by a layer of radiation sensitive material, the illumination system, or the projection system, or both the illumination system and the projection system, comprising a focusing element to reflect the beam of radiation;
• selecting a stop disc from a plurality of stop discs using a disc changer to supply the selected stop disc to a disc positioner, the disc changer external to the focusing element;
• and
• positioning the stop disc using the disc positioner adjacent the focusing element so that the beam of radiation passes through an aperture in the stop disc,
• wherein the disc changer and the focusing element are, in use, enclosed in a vacuum.

A lithographic apparatus, comprising:

• an illumination system configured to provide an EUV beam of radiation;
• a support configured to support a patterning device, the patterning device configured to impart a pattern to the EUV beam of radiation;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned EUV beam of radiation onto a target portion of the substrate;
• wherein the illumination system, or the projection system, or both the illumination system and the projection system, includes a focusing element within the EUV beam of radiation to shape and/or filter the EUV beam of radiation, and the apparatus further comprises
• a disc positioner configured to place a stop disc adjacent the focusing element so that the EUV beam of radiation passes through an aperture in the stop disc;
• and
• a disc changer configured to select the stop disc from a plurality of stop discs and supply the selected stop disc to the disc positioner, the disc changer being external to the focusing element,
• wherein the disc changer and the focusing element are, in use, enclosed within a vacuum.