Back to results
US 7,253,092 B2Granted
Tungsten plug corrosion prevention method using water
AssigneeNEC Electronics America, Inc.
InventorsElizabeth A. Dauch, John W. Jacobs
Life of this patent
Estimating the term…
Abstract
Disclosed herein is a method of making integrated circuits. In one embodiment the method includes forming tungsten plugs in the integrated circuit and forming electrically conductive interconnect lines in the integrated circuit after formation of the tungsten plugs. At least one tungsten plug is electrically connected to at least one electrically conductive interconnect line. Thereafter at least one electrically conductive interconnect line is contacted with water for a period of time less than 120 minutes.
Claims20
A method comprising:
- forming a tungsten plug in a dielectric layer;
- forming an electrically conductive interconnect line on the dielectric layer after formation of the tungsten plug, wherein the tungsten plug is electrically connected to the electrically conductive interconnect line;
- contacting the electrically conductive interconnect line with liquid water after formation of the electrically conductive interconnect line;
- contacting the electrically conductive interconnect line with a solution to remove residual polymer after the electrically conductive interconnect line is contacted with the liquid water;
- wherein the electrically conductive interconnect line is contacted with the liquid water for less than 120 minutes.
2 more elements
A method comprising:
- forming a tungsten plug in a dielectric layer;
- forming an electrically conductive interconnect line on the dielectric layer after formation of the tungsten plug, wherein the tungsten plug is electrically connected to the electrically conductive interconnect line;
- contacting the electrically conductive interconnect line with liquid water having a pH slightly less than neutral after formation of the electrically conductive interconnect line;
- contacting the electrically conductive interconnect line with a solution to remove residual polymer after the electrically conductive interconnect line is contacted with the liquid water;
- wherein the electrically conductive interconnect line is contacted with the liquid water for less than 120 minutes.
2 more elements
A method comprising:
- forming a tungsten plug in a dielectric layer;
- forming an electrically conductive interconnect line on the dielectric layer after formation of the tungsten plug, wherein the tungsten plug is electrically connected to the electrically conductive interconnect line;
- contacting the electrically conductive interconnect line with liquid water after formation of the electrically conductive interconnect line;
- contacting the electrically conductive interconnect line with a solution to remove residual polymer on the electrically conductive interconnect line after the electrically conductive interconnect line is contacted with the liquid water;
- wherein the electrically conductive interconnect line is contacted with the liquid water for less than 120 minutes.
2 more elements
Dependencies are inferred from the claim text.