System and method for abating the simultaneous flow of silane and arsine

A method of scrubbing an exhaust gas of a manufacturing process, the exhaust gas comprising a silane and arsine, the silane comprising a component depositable by thermal chemical vapor deposition, the method comprising:

• a. flowing the exhaust gas through an enclosure defining a chamber having a length and a central axis extending along said length and containing a plurality of substrates spaced from one another along said length and oriented substantially perpendicular to said central axis, said plurality of substrates including a plurality of apertures formed therein;
• b. baffling, the exhaust gas within said chamber by forcing the exhaust gas to flow substantially only through said plurality of apertures so as to increase the residence time of the exhaust gas within said chamber;
• c. causing a layer of the component of the silane to be thermal chemical vapor deposited onto ones of said plurality of substrates;
• and
• d. removing, in a chamber separate from said enclosure, the arsine from the exhaust gas after performing step c).